distant destinations: Static models are usually located remotely, increasing Charge and lowering Total system efficiency.
Software & TCU software program calibration processes range exterior take a look at tools not applied consistently for verifying
the data beneath is categorized by semiconductor process and Resource manufacturer. Each desk incorporates an purposes Matrix that exhibits qulified and professional processes.
initially Launched in 1985, our enterprise has developed into a regarded chief in offering temperature Command programs to the worldwide semiconductor field.
This amazing system, providing a small form aspect, cheap-of-possession and Dynamic Temperature Control offered method and tools engineers a whole new Device to optimize their temperature sensitive processes.
The accuracy of your POU 3300 allows for impartial control of the method fluid temperature towards the wafer chuck within +/- 0.one °C of set point, and the speedy response time in the technique permits for max wafer-to-wafer repeatability all through the etch procedure.
The precision of the POU 3500 permits impartial Charge of the method fluid temperature into the read more wafer chuck inside +/- 0.one °C of set stage, plus the quick response time in the procedure permits for max wafer-to-wafer repeatability through the entire etch method.
Using the POU3300, it is possible to achieve unprecedented brings about etch overall performance, chamber uptime, minimized expense of ownership and fab space utilization – all even though increasing your approach dependability.
the information pertains to some 300mm chamber temperature profile during a substantial aspect ratio Etch method, working at really substantial RF power conditions (~3.8kW). The powerful elements of this info set are:
LAUDA-Noah is meeting these new worries and has integrated Power conserving technology in units that happen to be pleasant into the environment and have a low priced to function.
The TEs' can switch straight from heating to cooling, or visa-versa. they will switch on & off though from the heating or cooling manner and will enhance or decrease the amount of heating or cooling without the need of switching in any way.
The POU3300 method features dynamic temperature control of the procedure chamber cathode / electrode / anode and will be synchronized with any etch course of action.
verified; TEs' depict only one part of a chiller's design. The switching & Management approaches utilized by a chiller will effects the TEs' trustworthiness.
(hence, installing a static unit next to chamber will not allow it to provide dynamic temperature Manage)
We have to have much less cooling/heating ability for a similar software to be a static TCU due to our tiny reservoir volume.